About FAC2008 Abstracts - March 2008

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Speaker : II Soon Hwang1
Authors : Kyung Ha Ryu*1, II Soon Hwang1, Na Young Lee2, Young Jin Oh3,
Jin Ho Park4 and Chang Ho Sohn5
profession : * Ph.D. Candidate
Company : 1 Seoul National University
2 Currently, Korea Institutes of Nuclear Nonproliferation and Control
3 Currently, Korea Power Engineering Company
4 Korea Atomic Electric Research Institute
5 Samchang Co. Ltd
Country : Republic of Korea
Topic : Non Destructive Examination methods
R&D and test loop results
Operation feed back
Piping maintenance
Sector : Nuclear
ABSTRACTS :
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Flow accelerated corrosion (FAC) phenomenon has persisted its impact on plant reliability and personnel safety. Unless we change the operation condition drastically, most parameters affecting FAC will not be effectively controlled. In order to help expand piping inspection coverage, we have developed a screening approach to monitor the wall thinning by a Direct Current Potential drop (DCPD) technique. To improve the applicability to the complex piping network such as the secondary cooling water system in PWR's, we devised the equipotential control method that can eliminate undesired leakage currents outside a measurement section. In this paper, we present Wide Range Monitoring (WiRM) and Narrow Range Monitoring (NaRM) with Equipotential Switching Direct Current Potential Drop (ES-DCPD) method to rapidly monitor the thinning of piping. Based on the WiRM results, susceptible locations can be identified for further inspection by Ultrasonic Technique (UT). On-line monitoring of a thinned location can be made by NaRM. Finite element analysis results and a closed-form resistance model are developed for the comparison with measured wall thinning by the developed DCPD technique. Verification experiments were conducted using UT as the reference. The result shows that model predictions and the experimental results agree well to confirm that both WiRM and NaRM based on ES-DCPD can be applicable to FAC management efforts.
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Schedule : Tuesday March 19th, 2008 2:30 - 3:00 PM
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